Eight transistor SRAM cell with improved stability requiring only one word line

ABSTRACT

An SRAM cell that is accessed by a single word line and separate access transistors for read and write operations. A pair of write bit line transfer devices provide respectively access to the right and left sides of cross coupled pull-up, pull-down transistor pairs for a write operation, and a single read bit line transistor in series with the word line transistor, when selected, reads the content of the cell.

CROSS-REFERENCE TO RELATED APPLICATIONS

This application contains subject matter that is related to the subjectmatter of the following co-pending applications, each of which isassigned to the same assignee as this application, InternationalBusiness Machines Corporation of Armonk, N.Y. Each of the below listedapplications is hereby incorporated herein by reference in its entirety.

TRADEMARKS

IBM® is a registered trademark of International Business MachinesCorporation, Armonk, N.Y., U.S.A. S/390, Z900 and z990 and other namesused herein may be registered trademarks, trademarks or product names ofInternational Business Machines Corporation

BACKGROUND OF THE INVENTION

1. Field of the Invention

This invention relates to an improved Static Random Access Memory (SRAM)cell and more particularly to stable cell with only one word line.

2. Description of the Background

Typical prior art CMOS SRAM cells have a six-transistor typology, suchas that shown in FIG. 1. Two P channel field effect transistors (PFETs)P1 and P2 act as pull up transistors and two N channel field effecttransistors (NFETs) N1 and N2 act as pull down transistors. Two NFETs N3and N4 serve as pass gates to control access to the cell for reading andwriting to the cell. These pass gates N3 and N4 are connected to a wordline WL. P1 and N1 form an inverter and P2 and N2 form another inverter.As shown these invertors are cross-coupled to form a bi-stable cell.

An SRAM array has n rows and m columns of SRAM cells with cells of a rowsharing a single word line WL and cells of a column sharing a pair ofbit lines BLL and BLR. During standby, all of the word lines WL are low(i.e., at GND) and all bit lines are biased to the voltage level of thepower supply Vdd. Thus, the pass-gate transistors of each cell are shutoff. A cell state representing a 1 data bit, for example, is establishedwith P1 and N2 on and P2 and N1 off so that the node L at the left ofthe cell is high (Vdd) and the node R at the right of the cell is low(GND). With P1 and N2 off and P2 and N1 on, node L is low and node R ishigh. During access time to the SRAM array a row is selected by drivingits word line WL high to Vdd, which turns on half of the pass gatesconnected to that word line; namely, those connected to a high node.Thus, for each cell along a word line, one pass gate is turned on.

During a read access, a cell in a selected column, where its bit linesprecharge devices are turned off, pulls down one of the bit lines (BL orBR) from its pre-charged high state (Vdd) by the “ON” passgate of thefull selected cell (one that is selected in both the word and columndimension). A sense amplifier detects the differential voltage betweenthe bit lines and generates an output. The cells along a selected wordline likewise generate a differential voltage, but these signals areignored. These cells along a selected word line that are not selected bythe columns are commonly referred to as “half selected” cells.Unselected columns could have their bit line precharge devices eitherturned off or stayed on, depending on the design preference.

High performance designs, such as for cache where read and writeoperations are performed within a short clock cycle, cell beta ratiosthat are typically in a range between 2.2 and 3.5 in order to avoidunintended changes in the state of a cell due to a so called“half-selected cell disturbance”. The beta ratio is a function of theratio of the channel resistance of the pass gate transistor to thechannel resistance of the pull down transistor. Half-selected celldisturbance occurs when a word line connected to a memory cell ofunselected columns with bit lines biased to a predetermined Vdd isactivated. This causes the body voltage of a pass-gate transistor of anon-selected cell to be more conductive than the cell pull downtransistor, there by causing the ground state node (“0” node) to switchstates and disrupt the state of the memory cell.

In fast switching environments a high beta ratio improves the marginpreventing half-selected cell disturbances. However a higher beta ratioresults in decreased cell performance, such as slower write.Particularly, sub 100 nm silicon technologies are having increasedproblems with cell SRAM cell stability when trying to write to the cellsat high rates due to the inherent variations in individual cell betaratios as a result to limitations in the degree to which device channelparameters can be controlled at these extremely small devices sizes.

Adding additional transistors to the basic six-transistor SRAM cell havebeen proposed in the prior art in order to prevent half-selected celldisturbance by providing separate access paths for reading and writing.However these prior art proposals have not proven satisfactory.Particularly, as they employ two separate word lines, one for writingand one for reading.

SUMMARY OF THE INVENTION

An object of this invention is the provision of an improved SRAM cellthat provides cell stability, with reduced cell area requirementswithout impacting the writing speed to the cell.

Another object of the invention is the provision of an improved SRAMcell with separate cell access paths for reading and writing and only asingle word line.

Briefly, this invention contemplates the provision of an SRAM cell thatis accessed by a single word line and separate access transistors forread and write operations. A pair of write bit line transfer devicesprovide respectively access to the right and left sides of cross coupledpull-up, pull-down transistor pairs for a write operation, and a singleread bit line transistor in series with the word line transistor, whenselected, reads the content of the cell.

DESCRIPTION OF THE DRAWINGS

The subject matter, which is regarded as the invention, is particularlypointed out and distinctly claimed in the claims at the conclusion ofthe specification. The foregoing and other objects, features, andadvantages of the invention are apparent from the following detaileddescription taken in conjunction with the accompanying drawings inwhich:

FIG. 1 is a schematic diagram of a typical prior art-six transistor SRAMCELL.

FIG. 2 is a schematic diagram of one embodiment of an SRAM cell inaccordance with the teachings of this invention.

The detailed description explains the preferred embodiments of theinvention, together with advantages and features, by way of example withreference to the drawings.

DETAILED DESCRIPTION OF THE INVENTION

Referring now to FIG. 2 of the drawings, the part of the cell comprisedof PFET pull-up transistors P1 and P2 and NFET pull-down transistors N1and N2 connected to nodes R and L is the same as the corresponding partof the prior art cell discussed above, where like reference numbers areused, and will not be further explained here. In accordance with theteachings of this invention, a pair of NFET write access transistors 24and 26 provides access to the nodes R and L in a write operation. Thesource of the left hand NFET 24 is connected to the left node L and thesource of the right hand NFET 26 is connected to the right node R. Thedrains of NFET 24 and 26 are connected to ground (i.e. common) via aword line NFET 28 whose source is connected to the drains of NFET 24 and26 and whose drain is connected to ground. The gate of the left writeaccess NFET 24 is connected to a normally low left write bit line wbl_land the gate of the right write access NFET 26 is connected to anormally low right write bit line wbl_r. The write bit access lineswbl_l and wbl_r are common to all of the cells in a column and arecoupled to word line control logic, not shown. The gate of the word lineNFET 28 is connected to a word line w1 that is common to all the cellsin a row and is connected to word line control logic, not shown.

Read access to the cell nodes L and R is provided by a read access NFET32 whose drain is connected to ground via the word line NFET 28 andwhose source is connected to a read bit line rb1, which is common to allthe cells in a column and is coupled to control logic and a senseamplifier, not shown. The gate of NFET 32 is connected to the node L inthis exemplary embodiment.

In operation, in order to write to the cell, one of the normally lowwrite bit lines wbl_l or wbl_r is brought high while the other write bitline remains in its normally low state. Concurrently, the word line w1is brought high. The node (L or R) connected to write access NFET (24 or26) whose gate is high is therefore connected to ground through thatwrite access NFET and the word line NFET 28. If the node is in a highstate, it is pulled down, causing the cell to change states. If the nodeis in a low state, the cell maintains its existing state.

Similarly, in order to read the state of the cell, the read bit line r1is precharged high before a read operation. Concurrently, the word linew1 is brought high so that the drain of read access transistor 32 isconnected to ground via word line NFET 28. In this exemplary embodiment,with the gate of read access NFET 32 connected to the left node L, ifthe node L is in its high state, NFET 32 conducts, connecting the readbit line r1 to ground via NFET 28, thus providing a signal indicatingthe high state of that side of the cell. If node L is in a low state,NFET 32 does not conduct, and bit line rl remains in its high state,thus providing a signal indicating the low state of that side of thecell.

While the preferred embodiment to the invention has been described, itwill be understood that those skilled in the art, both now and in thefuture, may make various improvements and enhancements which fall withinthe scope of the claims which follow. These claims should be construedto maintain the proper protection for the invention first described.

1. A static random access memory comprising in combination: a pluralityof bi-stable memory cells arranged in rows and columns; each of saidplurality of memory cells includes a first pull-up transistor and afirst pull-down transistor coupled in series between a supply voltageand common and cross coupled with a second pull-transistor and a secondpull-down transistor connected in series between said supply voltage andcommon, and with a first node between said first pull-up transistor andsaid second pull-down transistor and a second node between said secondpull-up transistor and said second pull-down transistor; cells in acolumn each connected via a pair of write access devices to a pair ofwrite bit lines for writing data into said cell; said cells in a columneach connected via a read access device to a read bit line, separatefrom said pair of write bit lines, for reading data from said cell; andcells in a row each connected via a word line access device to a singleword line; whereby activation to respective predetermined states of saidword line and said pair of write bit lines writes data to said cell andactivation of said word line and said read bit line reads data from saidcell.
 2. A static random access memory as in claim 1, wherein said pairof write access devices are coupled respectively between said pair ofwrite bit lines and said first and said second node and said read accessdevice is connected between said read bit line and said first node.
 3. Astatic random access memory as in claim 2, wherein said pair of writeaccess devices are each an FET, said read access device is an FET andsaid word line access device is an FET.
 4. A static random access memoryas in claim 2, wherein said pair of write access devices are each anNFET, said read access device is an NFET and said word line accessdevice is an NFET with the drains of said write access devices and thedrain of said read access device connected to the source of said wordline access device.
 5. A static random access memory as in claim 1,wherein said pair of write access devices are each an NFET, said readaccess device is an NFET and said word line access device is an NFETwith the drains of said write access devices and the drain of said readaccess device connected to the source of said word line access device.6. A static random access memory as in claim 1, wherein said pair ofwrite access devices are each an NFET, said read access device is anNFET and said word line access device is an NFET with the drains of saidwrite access devices and the drain of said read access device connectedto the source of said word line access device.
 7. A static random accessmemory comprising in combination: a plurality of bi-stable memory meansarranged in rows and columns; each of said plurality of bi-stable memorymeans includes a first pull-up transistor and a first pull-downtransistor coupled in series between a supply voltage and common andcross coupled with second pull-transistor and a second pull-downtransistor connected in series between said supply voltage and commonand with a first node between said first pull-up transistor and saidsecond pull-down transistor and a second node between said secondpull-up transistor and said second pull-down transistor; said memorymeans in a column each coupled to write access means for writing datainto said cell; said memory means in a column each connected a readaccess means separate from write access for reading data from said cell;and said memory means in a row each coupled to a word line access;whereby activation to respective predetermined states of said word linemeans and said write access means writes data to said cell andactivation of said word line means and said read access means reads datafrom said cell.
 8. A static random access memory as in claim 7, whereinsaid write access means includes a pair of FETs coupled respectivelybetween said pair of write bit lines and said first node and said secondnode and said read access means includes an FET connected between saidread bit line and said first node.
 9. A static random access memory asin claim 8, wherein said write access includes a pair of NFETs, saidread access means is an NFET and said word line access means is an NFETwith the drains of said write access NFETs and the drain of said readaccess NFET connected to the source of said word line NFET.
 10. A staticrandom access memory as in claim 7, wherein said write access includes apair of NFETs, said read access means is an NFET and said word lineaccess means is an NFET with the drains of said write access NFETs andthe drain of said read access NFET connected to the source of said wordline NFET.
 11. A static random access memory as in claim 10, whereinsaid write access includes a pair of NFETs, said read access means is anNFET and said word line access means is an NFET with the drains of saidwrite access NFETs and the drain of said read access NFET connected tothe source of said word line NFET.